Multi-Layered Based Seed Methodology for Self-Aligned Silicides

Description:

 

An improved process for producing silicide deposits on silicon-based semiconductor chips, with a reduction in the number of lithography steps and phases required.

 

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Patent Information:
For Information, Contact:
Christine Gramer
Senior Technology Development Associate
University of Oregon
cgramer@uoregon.edu
Inventors:
David Johnson
Jacob Jensen
Keywords:
Chemical
Materials Science
Nanoscience & Microtechnologies
ONAMI